Gas phase etching of silicon with HCl
- 1 March 1974
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 22 (1) , 29-33
- https://doi.org/10.1016/0022-0248(74)90054-2
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Silicon Epitaxy from Mixtures of SiH4 and HClJournal of the Electrochemical Society, 1970
- Vapor-Phase Polishing of Silicon with H2-HBr Gas MixturesIBM Journal of Research and Development, 1965
- Vapor Phase Deposition and Etching of SiliconJournal of the Electrochemical Society, 1965
- Emissivity at 0.65 Micron of Silicon and Germanium at High TemperaturesJournal of Applied Physics, 1957