A structural study of polycrystalline AlN films prepared by ion-beam-assisted deposition
- 14 May 1994
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 27 (5) , 1056-1059
- https://doi.org/10.1088/0022-3727/27/5/025
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- Chemical and electronic properties of aluminium nitride on GaAs(110)Applied Surface Science, 1992
- Crystalline orientation control for aluminum nitride films prepared by ion-beam-assisted technologyNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- Infrared and tunneling spectroscopy study of aluminum nitride films prepared by ion-beam depositionThe Journal of Physical Chemistry, 1990
- Temperature dependence of intrinsic stress in Fe, Si, and AlN prepared by ion beam sputteringJournal of Vacuum Science & Technology A, 1989
- Formation of ain by nitrogen molecule ion implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Auger electron and x-ray photoelectron spectroscopy of sputter deposited aluminum nitrideJournal of Applied Physics, 1984
- 1.0-GHz thin-film bulk acoustic wave resonators on GaAsApplied Physics Letters, 1983
- Characterisation of aluminium nitride layers formed directly by 700-800 keV15N2+implantation into aluminiumJournal of Physics D: Applied Physics, 1982
- Epitaxial Growth of Aluminum Nitride on Sapphire Using Metalorganic Chemical Vapor DepositionJapanese Journal of Applied Physics, 1981
- Reactive molecular beam epitaxy of aluminium nitrideJournal of Vacuum Science and Technology, 1979