Anti-oxidation properties of TiAlN film prepared by plasma-assisted chemical vapor deposition and roles of Al
- 1 October 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 307 (1-2) , 113-119
- https://doi.org/10.1016/s0040-6090(97)00212-5
Abstract
No abstract availableFunding Information
- Ministry of Education
This publication has 15 references indexed in Scilit:
- Comparative studies of TiN and Ti1−xAlxN by plasma-assisted chemical vapor deposition using a TiCl4/AlCl3/N2/H2/Ar gas mixtureThin Solid Films, 1996
- Quantitative AES investigation of magnetron sputtered Ti-Al-N filmsSurface and Coatings Technology, 1995
- (Ti1−xAlx)N coatings by plasma-enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1994
- High-temperature oxidation of ion-plated TiN and TiAlN filmsJournal of Materials Research, 1993
- Oxidation of metastable single-phase polycrystalline Ti0.5Al0.5N films: Kinetics and mechanismsJournal of Applied Physics, 1990
- Plasma-assisted chemical vapour deposition of TiN and TiC on steel: Properties of coatingsThin Solid Films, 1988
- Oxidation and embrittlement of Ti-6Al-2Sn-4Zr-2Mo alloyOxidation of Metals, 1986
- Dependence of the hardness of titanium nitride prepared by plasma chemical vapour deposition on the gas flow rate and the r.f. powerThin Solid Films, 1986
- A high rate sputtering process for the formation of hard friction-reducing TiN coatings on toolsThin Solid Films, 1982
- TiN coatings on steelThin Solid Films, 1981