Rapid Thermal Processing—A Justification
- 1 January 1993
- book chapter
- Published by Elsevier
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- Very thin oxide film on a silicon surface by ultraclean oxidationApplied Physics Letters, 1992
- Oxidation Process of Hydrogen Terminated Silicon Surface Studied by Thermal Desorption SpectroscopyJapanese Journal of Applied Physics, 1991
- Challenges to manufacturing submicron, ultra-large scale integrated circuitsProceedings of the IEEE, 1990
- Design methodology and size limitations of submicrometer MOSFETs for DRAM applicationIEEE Transactions on Electron Devices, 1988
- Challenges in advanced semiconductor technology for high-performance and supercomputer applicationsThe Journal of Supercomputing, 1987
- Constraints on the application of 0.5-µm MOSFET's to ULSI systemsIEEE Transactions on Electron Devices, 1985
- Device design for the submicrometer p-channel FET with n+polysilicon gateIEEE Transactions on Electron Devices, 1984
- MOS Device and technology constraints in VLSIIEEE Transactions on Electron Devices, 1982
- Silicon Oxidation Studies: The Role of H 2 OJournal of the Electrochemical Society, 1977
- Cost-size optima of monolithic integrated circuitsProceedings of the IEEE, 1964