Compositional changes during magnetron sputtering of alloys
- 1 April 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 199 (1) , 59-69
- https://doi.org/10.1016/0040-6090(91)90052-y
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Deposition and redeposition in magnetronsJournal of Vacuum Science & Technology A, 1988
- Applications of Monte Carlo simulation in the analysis of a sputter-deposition processJournal of Vacuum Science & Technology A, 1986
- Calculations of thermalization during the sputter deposition processVacuum, 1984
- The thermalization of energetic atoms during the sputtering processJournal of Vacuum Science & Technology A, 1984
- Reactive deposition of low loss Al2O3 optical waveguides by modified dc planar magnetron sputteringJournal of Vacuum Science & Technology A, 1984
- Monte Carlo simulation of the particle transport process in sputter depositionThin Solid Films, 1984
- Step coverage simulation and measurement in a dc planar magnetron sputtering systemJournal of Applied Physics, 1983
- Calculation of deposition rates in diode sputtering systemsJournal of Vacuum Science and Technology, 1978
- Selective thermalization in sputtering to produce high TcfilmsIEEE Transactions on Magnetics, 1975
- Some Calculations of the Thickness Distribution of Films Deposited from Large Area Sputtering SourcesJournal of Vacuum Science and Technology, 1969