Growth of an oxide film on a clean silicon surface and the kinetics of its evaporation
- 1 March 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 32 (2) , 247-249
- https://doi.org/10.1016/0040-6090(76)90305-9
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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- Structure and Adsorption Characteristics of Clean Surfaces of Germanium and SiliconThe Journal of Chemical Physics, 1959