Interaction between chromium oxide and chromium silicide
- 1 January 1983
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 54 (1) , 258-259
- https://doi.org/10.1063/1.331694
Abstract
We have used x‐ray induced photoemission spectroscopy and Rutherford backscattering spectroscopy to study the chemical reaction between Cr2O3 and CrSi2. We observed that upon annealing a Cr film on a Si substrate at 550 °C to form CrSi2, the native chromium surface oxide will decompose while a film of SiO2 will form when the CrSi2 growth front reaches the Cr2O3.This publication has 6 references indexed in Scilit:
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