Low-level leakage currents in thin silicon oxide films

This publication has 24 references indexed in Scilit:

• Tunneling and thermal emission of electrons from a distribution of deep traps in SiO/sub 2/ (nMOSFET)
  IEEE Transactions on Electron Devices, 1993
• Correlation of stress-induced leakage current in thin oxides with trap generation inside the oxides
  IEEE Transactions on Electron Devices, 1993
• Reliability issues of flash memory cells
  Proceedings of the IEEE, 1993
• Defect electrical conduction in SIMOX buried oxides
  IEEE Transactions on Electron Devices, 1993
• Stress-induced oxide leakage
  IEEE Electron Device Letters, 1991
• Electrical conduction in MOS capacitors with an ultra-thin oxide layer
  Solid-State Electronics, 1991
• High-field-induced degradation in ultra-thin SiO/sub 2/ films
  IEEE Transactions on Electron Devices, 1988
• Defect Microchemistry at the SiO2/Si Interface
  Physical Review Letters, 1987
• Behavior of the Si/SiO2 interface observed by Fowler-Nordheim tunneling
  Journal of Applied Physics, 1982
• Fowler-Nordheim Tunneling into Thermally Grown SiO2
  Journal of Applied Physics, 1969