Plasma and surface reactions for obtaining low defect density amorphous silicon at high growth rates
- 1 January 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 16 (1) , 365-368
- https://doi.org/10.1116/1.581105
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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