On the influence of crater geometry on depth resolution of AES and XPS profiles of tantalum oxide films
- 1 April 1983
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 5 (2) , 77-82
- https://doi.org/10.1002/sia.740050205
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- The kinetics of formation and structure of anodic oxide films on tantalumActa Metallurgica, 1953