Techniques for the compositional and chemical state analysis of surfaces and thin films
- 15 December 1983
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research
- Vol. 218 (1-3) , 391-399
- https://doi.org/10.1016/0167-5087(83)91011-6
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Organic conductors as electron beam resist materialsApplied Physics Letters, 1982
- Secondary ion mass spectrometry and Rutherford backscattering spectroscopy for the analysis of thin filmsJournal of Vacuum Science and Technology, 1981
- Detection sensitivities for thick specimens in proton and electron induced x-ray spectrometryAnalytical Chemistry, 1977
- Auger study of preferred sputtering on binary alloy surfacesSurface Science, 1976
- Developments in secondary ion mass spectroscopy and applications to surface studiesSurface Science, 1975
- Quantitative analysis of complex targets by proton-induced x raysJournal of Applied Physics, 1975
- Ga1−x Alx As superlattices profiled by Auger electron spectroscopyApplied Physics Letters, 1974
- Principles and applications of ion beam techniques for the analysis of solids and thin filmsThin Solid Films, 1973
- Inner-Shell Vacancy Production in Ion-Atom CollisionsReviews of Modern Physics, 1973
- Interaction of 25 keV Electrons with the Nucleic Acid Bases, Adenine, Thymine, and Uracil. I. Outer Shell ExcitationThe Journal of Chemical Physics, 1972