Effect of substrate temperatures and annealing on optically detected magnetic resonance in glow-discharge amorphous silicon
- 31 December 1979
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 32 (9) , 795-799
- https://doi.org/10.1016/0038-1098(79)90757-9
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
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- Electron Spin Resonance in Amorphous Silicon, Germanium, and Silicon CarbidePhysical Review Letters, 1969