A study of residual background doping in high purity indium phosphide grown by atmospheric pressure OMVPE
- 1 November 1987
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 85 (3) , 535-542
- https://doi.org/10.1016/0022-0248(87)90487-8
Abstract
No abstract availableKeywords
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