High-density tantalum-film microcircuits
- 1 January 1962
- journal article
- Published by Elsevier in Microelectronics Reliability
- Vol. 1 (4) , 311-319
- https://doi.org/10.1016/0026-2714(62)90035-5
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Multiple Cathode Sputtering SystemReview of Scientific Instruments, 1961
- The Oxidation of Sputtered Tantalum Films and Its Relationship to the Stability of the Electrical Resistance of These FilmsIRE Transactions on Component Parts, 1961
- Integrated Thin-Film CircuitsIRE Transactions on Component Parts, 1961
- Hot Electrons in Metal Films: Injection and CollectionPhysical Review Letters, 1961
- Diffusion and oxide masking in silicon by the box methodSolid-State Electronics, 1960
- Surface Protection and Selective Masking during Diffusion in SiliconJournal of the Electrochemical Society, 1957