Integrated Thin-Film Circuits
- 1 June 1961
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IRE Transactions on Component Parts
- Vol. 8 (2) , 70-79
- https://doi.org/10.1109/tcp.1961.1136596
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- The penetration of positive ions of low energy into alloys and composition changes produced in them by sputteringJournal of Physics and Chemistry of Solids, 1959
- Tantalum Printed CapacitorsProceedings of the IRE, 1959
- Temperature Coefficients of Resistance of Metallic Films in the Temperature Range 25° to 600°CJournal of Applied Physics, 1959
- Cathodic Sputtering for Micro-Diffusion StudiesJournal of Applied Physics, 1952
- Cathode Sputtering in the Abnormal Glow DischargePhysical Review B, 1949