Properties of thin Ta–N films reactively sputtered on Cu/SiO2/Si substrates
- 1 June 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 322 (1-2) , 213-217
- https://doi.org/10.1016/s0040-6090(97)00914-0
Abstract
No abstract availableKeywords
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