Preferred sputtering on binary alloy surfaces of the AlPdSi system
- 2 June 1979
- journal article
- Published by Elsevier in Surface Science
- Vol. 85 (1) , 19-28
- https://doi.org/10.1016/0039-6028(79)90229-2
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
- Effects of enhanced diffusion on preferred sputtering of homogeneous alloy surfacesSurface Science, 1978
- A model for surface layer composition changes in sputtered alloys and compoundsApplied Physics Letters, 1977
- Surface-layer composition changes in sputtered alloys and compoundsApplied Physics Letters, 1977
- Surface enrichment of copper due to keV Xe sputtering of an Al-Cu mixtureJournal of Applied Physics, 1976
- Auger study of preferred sputtering on binary alloy surfacesSurface Science, 1976
- Ion sputtering of alloysJournal of Vacuum Science and Technology, 1976
- Influence of the altered layer on depth profiling measurementsApplied Physics Letters, 1976
- The sputtering of PtSi and NiSiNuclear Instruments and Methods, 1976
- Quantitative auger analysis of copper-nickel alloy surfaces after argon ion bombardmentSurface Science, 1973
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969