Improvement of sidewall surface roughness in silicon-on-insulator rib waveguides
- 1 September 2005
- journal article
- research article
- Published by Springer Nature in Applied Physics B Laser and Optics
- Vol. 81 (5) , 691-694
- https://doi.org/10.1007/s00340-005-1951-x
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technologyJournal of Lightwave Technology, 2005
- Size Influence on the Propagation Loss Induced by Sidewall Roughness in Ultrasmall SOI WaveguidesIEEE Photonics Technology Letters, 2004
- Thermal-flow technique for reducing surface roughness and controlling gap size in polymer microring resonatorsApplied Physics Letters, 2004
- A high-speed silicon optical modulator based on a metal–oxide–semiconductor capacitorNature, 2004
- Sidewall roughness control in advanced silicon etch processMicrosystem Technologies, 2003
- Structural Modification of a Trench by Hydrogen AnnealingJournal of the Korean Physical Society, 2000
- Improvement of sidewall roughness in deep silicon etchingMicrosystem Technologies, 2000
- Losses in polycrystalline silicon waveguidesApplied Physics Letters, 1996
- A theoretical analysis of scattering loss from planar optical waveguidesOptical and Quantum Electronics, 1994
- Rough surfaces: gaussian or exponential statistics?Journal of Physics D: Applied Physics, 1989