Rapid thermal annealing effects on the properties of plasma-enhanced chemical vapor deposited tungsten films
- 15 August 1991
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 70 (4) , 2366-2369
- https://doi.org/10.1063/1.349437
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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