In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry
- 1 November 2004
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 85 (18) , 4166-4168
- https://doi.org/10.1063/1.1811396
Abstract
To optimize nanoimprint lithography (NIL), it is essential to be able to characterize and control the NIL process in situ and in real time. Here, we present a method for in situ real-time NIL process characterization using time-resolved diffractive scatterometry (TRDS). A surface relief diffraction grating is used as the imprint mold, and the diffracted light intensity is monitored continuously during the imprint process. We use a scalar diffraction model to calculate the diffraction intensity as a function of the mold penetration ratio. Simulations show good agreement with the experimental results. Our results indicate that TRDS offers a powerful characterization tool that can be used for in situ, real-time NIL process control.Keywords
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