Spectroscopic investigations of hydrogen termination, oxide coverage, roughness, and surface state density of silicon during native oxidation in air
- 1 December 2002
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 202 (3-4) , 199-205
- https://doi.org/10.1016/s0169-4332(02)00923-6
Abstract
No abstract availableKeywords
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