The Anderson transition in silicon inversion layers: the origin of the random field and the effect of substrate bias
- 25 March 1977
- journal article
- Published by The Royal Society in Proceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences
- Vol. 353 (1673) , 225-246
- https://doi.org/10.1098/rspa.1977.0031
Abstract
The purpose of this paper is to present results on and discuss the origin of Anderson localization in the inversion layer. Evidence is given for the existence of both negative and positive charges at the Si/SiO$_{2}$ interface. The negative charges contribute at least in part to the slow states at the Si/SiO$_{2}$ interface. The origin of these charges is discussed and a model proposed which provides an explanation of the conflicting reports on the value of minimum metallic conductivity, and the change in the extent of the localization as the distance between the carriers and the Si/SiO$_{2}$ interface is changed. It is suggested that in a two dimensional system long range potential fluctuations increase the minimum metallic conductivity above the value predicted, and found experimentally, for (the Anderson model with) short range potential fluctuations.Keywords
This publication has 30 references indexed in Scilit:
- Optically Induced Localized Paramagnetic States in Amorphous SemiconductorsPhysical Review Letters, 1976
- Frequency Dependence of the Electron Conductivity in the Silicon Inversion Layer in the Metallic and Localized RegimesPhysical Review Letters, 1975
- High temperature 'variable range hopping' conductivity in silicon inversion layersJournal of Physics C: Solid State Physics, 1975
- Structural and electrical properties of granular metal filmsAdvances in Physics, 1975
- A new model for the negative voltage instability in MOS devicesApplied Physics Letters, 1975
- Substrate Bias Effects on Electron Mobility in Silicon Inversion Layers at Low TemperaturesPhysical Review Letters, 1975
- Oxygen vacancy model for the E1′ center in SiO2Solid State Communications, 1974
- The Current Understanding of Charges in the Thermally Oxidized Silicon StructureJournal of the Electrochemical Society, 1974
- Surface charge and stress in the Si/SiO2 systemSolid-State Electronics, 1973
- Sodium Ion Drift through Phosphosilicate Glass-SiO[sub 2] FilmsJournal of the Electrochemical Society, 1971