Silicon wafer processing by application of spun-on doped and undoped silica layers
- 31 January 1974
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 17 (1) , 87-94
- https://doi.org/10.1016/0038-1101(74)90116-6
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- Strain Effects Around Planar Diffused StructuresJournal of the Electrochemical Society, 1968
- Effects of Phosphorus Diffusions in Epitaxial Silicon LayersJournal of the Electrochemical Society, 1968
- Effects of High Phosphorus Concentration on Diffusion into SiliconJournal of the Electrochemical Society, 1968
- X-ray measurement of elastic strain and lattice constant of diffused siliconSolid-State Electronics, 1967
- Distribution of Boron-Induced Defects in Shallow Diffused Surface Layers of SiliconJournal of Applied Physics, 1966
- Dielectric Thin Films through rf SputteringJournal of Applied Physics, 1966
- Diffusion-Induced Stress and Lattice Disorders in SiliconJournal of the Electrochemical Society, 1966
- Studies of anomalous diffusion of impurities in siliconSolid-State Electronics, 1966
- Diffusion-Induced Imperfections in SiliconJournal of the Electrochemical Society, 1965
- A Novel Technique for the Deposition of Silica FilmsJournal of the Electrochemical Society, 1964