Carrier scattering by native defects in heavily doped semiconductors
- 15 May 1990
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 41 (14) , 10218-10220
- https://doi.org/10.1103/physrevb.41.10218
Abstract
Calculations of the effect of charged native defects on carrier mobility in semiconductors are presented. The concentrations of native defects are calculated within the framework of the recently proposed amphoteric-native-defect model. The model provides a simple rule for identification of semiconductor systems in which defect scattering is important. It is shown that native-defect scattering is a dominant mechanism limiting electron mobilities in heavily doped n-type GaAs. It is also shown that native defects do not play any significant role in p-type GaAs.Keywords
This publication has 15 references indexed in Scilit:
- Amphoteric native defects in semiconductorsApplied Physics Letters, 1989
- Fermi level dependent native defect formation: Consequences for metal–semiconductor and semiconductor–semiconductor interfacesJournal of Vacuum Science & Technology B, 1988
- Mechanism of Fermi-level stabilization in semiconductorsPhysical Review B, 1988
- Mechanism of compensation in heavily silicon-doped gallium arsenide grown by molecular beam epitaxyApplied Physics Letters, 1987
- Multi-ion Screening in Uncompensated SemiconductorsPhysical Review Letters, 1986
- Electronic Structure, Total Energies, and Abundances of the Elementary Point Defects in GaAsPhysical Review Letters, 1985
- Highly doped GaAs:Si by molecular beam epitaxyApplied Physics Letters, 1985
- Electron mobility in modulation-doped heterostructuresPhysical Review B, 1984
- Band-gap narrowing in heavily doped many-valley semiconductorsPhysical Review B, 1981
- Si-defect concentrations in heavily Si-doped GaAs: Changes induced by annealingJournal of Applied Physics, 1974