Design of an end station for a high current ion implantation system
- 1 January 1979
- journal article
- research article
- Published by Taylor & Francis in Radiation Effects
- Vol. 44 (1) , 81-92
- https://doi.org/10.1080/00337577908245982
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Localized substrate heating during ion implantationJournal of Vacuum Science and Technology, 1978
- The design philosophy for a 200 kV industrial high current ion implanterNuclear Instruments and Methods, 1976
- Target heating during ion implantationJournal of Vacuum Science and Technology, 1976
- Rotating Scan for Ion ImplantationJournal of the Electrochemical Society, 1975