Synthesis of High-Quality Ultra-Thin Gate Oxides for ULSI Applications
- 12 November 1988
- journal article
- website
- Published by Institute of Electrical and Electronics Engineers (IEEE) in AT&T Technical Journal
- Vol. 67 (6) , 155-174
- https://doi.org/10.1002/j.1538-7305.1988.tb00072.x
Abstract
No abstract availableKeywords
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