In Situ Ellipsometric Monitoring of the Growth of Polycrystalline Silicon Thin Films by RF Plasma Chemical Vapor Deposition
- 1 July 1994
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 33 (7S) , 4191-4194
- https://doi.org/10.1143/jjap.33.4191
Abstract
No abstract availableKeywords
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