Computer simulation of resist heating in electron-beam lithography
- 31 March 1992
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 17 (1-4) , 395-398
- https://doi.org/10.1016/0167-9317(92)90080-b
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Resist heating effects in 25 and 50 kV e-beam lithography on glass masksJournal of Vacuum Science & Technology B, 1990
- Thermal distribution and the effect on resist sensitivity in electron-beam direct writeJournal of Vacuum Science & Technology B, 1989
- Thermal effects in electron beam lithographyJournal of Vacuum Science & Technology B, 1989
- Resist heating effect in direct electron beam writingJournal of Vacuum Science & Technology B, 1988
- The effect of acceleration voltage on linewidth control with a variable-shaped electron beam systemJournal of Vacuum Science & Technology B, 1987
- Sub-Micron Pattern Control Technology for Variable-Shaped EB LithographyJapanese Journal of Applied Physics, 1983
- Temperature effects on positive electron resists irradiated with electron beam and deep-UV lightJournal of Applied Polymer Science, 1982
- Determination of Kilovolt Electron Energy Dissipation vs Penetration Distance in Solid MaterialsJournal of Applied Physics, 1971