Fabrication of ordered arrays of silicon nanopillars
- 3 December 1999
- journal article
- research article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 32 (24) , L129-L132
- https://doi.org/10.1088/0022-3727/32/24/102
Abstract
We report the fabrication of ordered arrays of silicon nanopillars via reactive ion etching (RIE). Self-assembled polymer spheres are used as masks for the deposition of hexagonal arrays of Ag islands on a silicon substrate. Following the removal of the polymer spheres, the sample is etched with SF6 and CF4 at 100 W leading to hexagonal arrays of silicon nanopillars. The aspect ratio of the pillars can be influenced by the etching time; maximum aspect ratios of 15:1 have been produced.Keywords
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