A continuous electrical resistivity measurement in thin films
- 1 December 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 270 (1) , 367-370
- https://doi.org/10.1016/0040-6090(95)06927-5
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Scanning electrical resistometry (SER) of Cr thin film oxidationVacuum, 1995
- Interfacial reactions in dynamically heated Si/Me/Si sandwich layersThin Solid Films, 1994
- High-temperature oxidation of (Ti,Pd)N and (Cr,Pd)N coatings studied with AES and XPS sputter depth profilingVacuum, 1994
- Interfacial reactions and silicide formation in Si/Ni/Si and Si/Cr/Si sandwich layersSurface and Interface Analysis, 1994
- High temperature oxidation of ion-plated CrN filmsJournal of Materials Research, 1994
- Conductivity changes in Ni films on Si(111) following compound formation during annealingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- A review of thin-film aluminide formationMaterials Science Reports, 1990
- Low temperature oxidation behavior of reactively sputtered TiN by x‐ray photoelectron spectroscopy and contact resistance measurementsJournal of Vacuum Science & Technology A, 1986
- A New Method of Analyzing Thermogravimetric DataBulletin of the Chemical Society of Japan, 1965