Selective deposition of anatase and rutile films by KrF laser chemical vapor deposition from titanium isopropoxide
- 13 January 2002
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 406 (1-2) , 132-137
- https://doi.org/10.1016/s0040-6090(01)01748-5
Abstract
No abstract availableKeywords
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