Microstructure of thin films prepared by plasma-enhanced chemical vapour deposition of helium-diluted silane
- 1 April 1999
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 143 (1-4) , 11-15
- https://doi.org/10.1016/s0169-4332(99)00086-0
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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