Modeling of chemical vapor deposition
- 1 December 1982
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 60 (2) , 297-306
- https://doi.org/10.1016/0022-0248(82)90102-6
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Vapor phase etching of GaAs in a chlorine systemJournal of Crystal Growth, 1981
- Growth and etching of silicon in chemical vapour deposition systems; The influence of thermal diffusion and temperature gradientJournal of Crystal Growth, 1975
- A comparative thermodynamic analysis of InP and GaAs depositionJournal of Physics and Chemistry of Solids, 1975
- Epitaxial GaAs Kinetic Studies: {001} OrientationJournal of the Electrochemical Society, 1970
- Reaction Equilibria in the Growth of GaAs and GaP by the Chloride Transport ProcessJournal of the Electrochemical Society, 1970
- Vapor Phase Deposition and Etching of SiliconJournal of the Electrochemical Society, 1965
- The Transport of Gallium Arsenide in the Vapor Phase by Chemical ReactionJournal of the Electrochemical Society, 1964