Temperature dependence of boron diffusion in (111), (110) and (100) silicon

This publication has 6 references indexed in Scilit:

• Anisotropic boron diffusion in silicon under oxidizing atmospheres
  Solid State Communications, 1973
• Effect of oxidation on orientation-dependent boron diffusion in silicon
  Solid-State Electronics, 1973
• Boron redistribution at the oxide–silicon interface during drive-in in oxidising atmospheres
  Electronics Letters, 1973
• Orientation dependence of the diffusion of boron in silicon
  Solid-State Electronics, 1971
• The orientation dependent diffusion of boron in silicon under oxidizing conditions
  Solid-State Electronics, 1969
• Redistribution of Diffused Boron in Silicon by Thermal Oxidation
  Japanese Journal of Applied Physics, 1964