Shallow junctions, silicide requirements and process technologies for sub 0.5 μm CMOS: Invited review paper
- 30 September 1992
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 19 (1) , 649-656
- https://doi.org/10.1016/0167-9317(92)90515-s
Abstract
No abstract availableKeywords
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