Adsorption of Simple Diatomic Gases on Evaporated Boron Films

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Abstract
The adsorption behavior of N2, H2, O2, and CO has been studied on evaporated films of amorphous boron at 300°K. Evidence is presented for believing that H2, O2, and CO chemisorb readily on these films at 300°K. This evidence is derived from several sources: observations of significant reductions in the surface areas of the films after exposure to the gases, the rapid adsorption of large amounts of the gases on the films, and the apparent irreversibility of the gas adsorption. Nitrogen is not observed to chemisorb to any significant extent on the boron films at 300°K.

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