Low-energy double ion-beam deposition of compound films
- 1 February 1989
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 37-38, 866-869
- https://doi.org/10.1016/0168-583x(89)90316-9
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Low-Energy Double-Ion-Beam Deposition SystemJapanese Journal of Applied Physics, 1988
- PIG-Type Compact Microwave Metal Ion SourceJapanese Journal of Applied Physics, 1987
- Ion beam epitaxy of silicon on Ge and Si at temperatures of 400 KApplied Physics Letters, 1982