Effect of gas exposure on the EPR signal from amorphous silicon films
- 1 July 1978
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 27 (2) , 91-94
- https://doi.org/10.1016/0038-1098(78)90809-8
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- ESR and Conductivity in Amorphous Germanium and SiliconPhysica Status Solidi (b), 1977
- The effect of oxygen on the resistivity of evaporated amorphous germanium thin filmsThin Solid Films, 1976
- Influence of evaporation parameters on electrical properties of amorphous germanium and siliconPhysica Status Solidi (a), 1975
- Auger spectroscopy studies of the oxidation of amorphous and crystalline germaniumJournal of Applied Physics, 1975
- Observation of strong bulk oxidation effects in amorphous germanium by ultraviolet reflectance spectroscopyApplied Physics Letters, 1974
- Electrical and Structural Properties of Amorphous GermaniumPhysical Review B, 1973
- The structure of amorphous GeJournal of Non-Crystalline Solids, 1972
- Optical Evidence for a Network of Cracklike Voids in Amorphous GermaniumPhysical Review Letters, 1971
- Effect of Oxygen on the Electron Spin Resonance Spectrum of α,α′-Diphenyl-β-picrylhydrazylNature, 1958