Crystal growth and microstructure of polycrystalline Ti1−xAlxN alloy films deposited by ultra-high-vacuum dual-target magnetron sputtering
- 4 September 2002
- journal article
- Published by Elsevier
- Vol. 235 (1-2) , 62-70
- https://doi.org/10.1016/0040-6090(93)90244-j
Abstract
No abstract availableKeywords
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