Etching of chemically vapour-deposited amorphous Si3N4-C composites in HF solution
- 1 November 1983
- journal article
- research article
- Published by Springer Nature in Journal of Materials Science
- Vol. 18 (11) , 3387-3392
- https://doi.org/10.1007/bf00544164
Abstract
No abstract availableKeywords
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