Thermionic currents and acceptor diffusion in p+-In0.53Ga0.47As/n-InP heterojunctions
- 1 September 1987
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 62 (5) , 1920-1924
- https://doi.org/10.1063/1.339581
Abstract
p+‐In0.53Ga0.47As/n‐InP heterojunctions grown by liquid‐phase epitaxy have been investigated through I‐V and I0(T) measurements. It is shown that the injection of electrons across the heterointerface is well described by a thermionic emission model characterized by a barrier height which is strongly affected by p‐type dopant diffusion. Heterojunction bipolar transistors with Schottky collectors were used as tools to measure the injection current in as‐grown p+‐In0.53Ga0.47As/n‐InP diodes, and the results were compared to the predictions of the thermionic emission model. In this way, the relative diffusivity in InP at 600 °C of three p‐type dopants, Mn, Mg, and Be, have been evaluated. The results can be summarized as follows: DBe/DMn≊20, DMg/DBe≊1. The effects of postgrowth heat treatments on the observed barrier height are also discussed.This publication has 10 references indexed in Scilit:
- InGaAs/InAlAs heterojunction Schottky transistors grown by MBEElectronics Letters, 1986
- Measurement of the conduction band discontinuities of InGaAsP/InP heterojunctions using capacitance–voltage analysisJournal of Vacuum Science & Technology B, 1986
- VA-8 Fabrication, characterization, and modeling of inverted mode InGaAs/InP heterojunction bipolar transistorsIEEE Transactions on Electron Devices, 1985
- Manganese as a p-type dopant for liquid-phase-epitaxial In0.53Ga0.47AsJournal of Applied Physics, 1985
- Fabrication of widegap-emitter Schottky-collector transistor using GaInAs/InPElectronics Letters, 1985
- MgO-free surface of Mg-doped LPE InGaAs on InPJournal of Crystal Growth, 1984
- Identification of the residual acceptors in undoped high purity InPApplied Physics Letters, 1984
- Material parameters of In1−xGaxAsyP1−y and related binariesJournal of Applied Physics, 1982
- LPE Growth Techniques for Fabricating Abrupt Zinc‐ and Magnesium‐Doped p+‐n InGaAsP / InP HeterojunctionsJournal of the Electrochemical Society, 1982
- Indium PhosphideJournal of the Electrochemical Society, 1973