Photobias effect in laser-controlled etching of InP
- 26 September 1988
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 53 (13) , 1198-1200
- https://doi.org/10.1063/1.100018
Abstract
We have investigated laser-assisted photochemical etching of InP in aqueous solutions without external electric fields. The process produces highly directional, high-aspect features with smooth vertical walls. Additionally, we demonstrate that the laser etching rate may be controlled externally by the application of a secondary light source.Keywords
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