Localized laser etching of compound semiconductors in aqueous solution
- 1 March 1982
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 40 (5) , 391-393
- https://doi.org/10.1063/1.93113
Abstract
A laser-based technique for rapid, anisotropic etching of compound semiconductors is described. Both holes for through-wafer vias and high-resolution diffraction gratings have been made with the process.Keywords
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