A comparison of the electron beam sensitivities and relative oxygen plasma etch rates of various organosilicon polymers
- 1 December 1985
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 3 (1-4) , 279-291
- https://doi.org/10.1016/0167-9317(85)90038-3
Abstract
No abstract availableKeywords
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