Thin film microstructure modelling through line-segment simulation
- 1 September 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 266 (1) , 83-88
- https://doi.org/10.1016/0040-6090(95)06672-1
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
- Simulation of elevated temperature aluminum metallization using SIMBADIEEE Transactions on Electron Devices, 1992
- Macroscopic model for columnar growth of amorphous films by sputter depositionJournal of Vacuum Science & Technology A, 1991
- Molecular dynamics modeling of vapor-phase and very-low-energy ion-beam crystal growth processesCritical Reviews in Solid State and Materials Sciences, 1990
- Simulation by ballistic deposition of local density variation and step coverage for via metallizationIEEE Electron Device Letters, 1989
- Computer simulations of epitaxial growthPhysical Review B, 1989
- Ballistic deposition on surfacesPhysical Review A, 1986
- Process modeling for submicron complementary metal-oxide-semiconductor very large scale integrated circuitsJournal of Vacuum Science & Technology A, 1986
- Model for Columnar Microstructure of Thin Solid FilmsPhysical Review Letters, 1986
- A general simulator for VLSI lithography and etching processes: Part II—Application to deposition and etchingIEEE Transactions on Electron Devices, 1980
- Theory of Thermal GroovingJournal of Applied Physics, 1957