Microstructural investigations on titanium nitride films formed by medium energy ion beam assisted deposition
- 1 January 1993
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 80-81, 1409-1414
- https://doi.org/10.1016/0168-583x(93)90810-s
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Ion beam assisted deposition with a duoplasmatrona)Review of Scientific Instruments, 1992
- Characterization of aluminium films deposited by ion-beam-assisted ultrahigh vacuum evaporationSurface and Coatings Technology, 1990
- Preferentially Oriented Crystal Growth in Dynamic Mixing Process–An Approach by Monte Carlo Simulation–Japanese Journal of Applied Physics, 1990
- Microstructure and mechanical properties of high dose nitrogen-implanted iron, chromium and titanium sheetsMaterials Science and Engineering: A, 1989
- Crystalline orientation control by the IVD methodNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
- Summary Abstract: Theory of thin-film orientation by ion bombardment during depositionJournal of Vacuum Science & Technology A, 1987
- Ion beam modification of TiN films during vapor depositionMaterials Science and Engineering, 1987
- Formation of compounds by high-flux nitrogen ion implantation in titaniumJournal of Materials Science, 1986
- Ion-beam-induced texture formation in vacuum-condensed thin metal filmsThin Solid Films, 1982
- Effect of ion bombardment on the initial stages of thin film growthThin Solid Films, 1977