Effects on ellipsometric parameters caused by heat treatment of silicon (111) surface
- 31 July 1977
- journal article
- Published by Elsevier in Surface Science
- Vol. 65 (2) , 633-640
- https://doi.org/10.1016/0039-6028(77)90471-x
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- General Treatment of the Effect of Cell Windows in Ellipsometry*Journal of the Optical Society of America, 1971
- Auger electron spectroscopySurface Science, 1971
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- The influence of substrate surface conditions on the nucleation and growth of epitaxial silicon filmsSurface Science, 1969
- Vacuum Thermal Etching of Germanium and Silicon SurfacesJournal of the Electrochemical Society, 1967