Ellipsometric study of cleaning silicon by ion bombardment and heating in vacuum
- 31 May 1972
- journal article
- other
- Published by Elsevier in Surface Science
- Vol. 30 (3) , 680-686
- https://doi.org/10.1016/0039-6028(72)90055-6
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Ellipsometric study of 400ev ion damage in siliconSurface Science, 1972
- Parameter-Correlation and Computational Considerations in Multiple-Angle Ellipsometry*Journal of the Optical Society of America, 1971
- Ellipsometry and the clean surfaces of silicon and germaniumSurface Science, 1971
- Sputter cleaning and etching of crystal surfaces (Ti, W, Si) monitored by Auger spectroscopy, ellipsometry and work function changeSurface Science, 1971
- Texture of surfaces cleaned by ion bombardment and annealingSurface Science, 1970
- Low Voltage Electron Diffraction Study of the Oxidation and Reduction of SiliconJournal of Applied Physics, 1962
- Surface Cleaning by Cathode SputteringJournal of Applied Physics, 1960