Photothermal rate-window spectrometry for noncontact bulk lifetime measurements in semiconductors
- 15 May 1993
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 73 (10) , 5043-5048
- https://doi.org/10.1063/1.353775
Abstract
A new noncontact technique for the determination of excess carrier lifetimes in semiconductors is presented. The technique employs a square laser pulse (hν≥Eg) and measures the infrared photothermal radiometric response of the sample. By applying the photothermal rate‐window concept, the excess photoexcited carrier bulk lifetime was measured with optimal signal‐to‐noise (S/N) ratio and simple, unambiguous interpretation from the maximum position of the rate‐window signal. The technique has been applied to Au‐, Fe‐, and Cr‐doped Czochralski silicon crystals. The experimental results from boxcar and lock‐in rate‐window methods were found to agree very well. The results are further mostly in agreement with those from the noncontact laser/microwave detection method.This publication has 21 references indexed in Scilit:
- Thermal-diffusivity measurements of ultrahigh thermal conductors with use of scanning photothermal rate-window spectrometry: Chemical-vapor-deposition diamondsPhysical Review B, 1992
- Lock-in rate-window thermomodulation (thermal wave) and photomodulation spectrometryReview of Scientific Instruments, 1992
- Measurement of bulk lifetime and surface recombination velocity by infrared absorption due to pulsed optical excitationJournal of Applied Physics, 1991
- Non-contacting determination of carrier lifetime and surface recombination velocity using photothermal radiometryMaterials Science and Engineering: B, 1990
- Modelling of the photothermal radiometric response of a layered dielectric-on-semiconductor structureMaterials Science and Engineering: B, 1990
- Minority Carrier Diffusion Length Mapping in Silicon Wafers Using a Si‐Electrolyte‐ContactJournal of the Electrochemical Society, 1988
- Photothermal RadiometryPhysica Scripta, 1979
- A Nondestructive Method for Measuring the Spatial Distribution of Minority Carrier Lifetime in Silicon WaferJapanese Journal of Applied Physics, 1979
- Observation of carrier densities in silicon devices by infrared emissionJournal of Physics E: Scientific Instruments, 1977
- Intrinsic Optical Absorption in Single-Crystal Germanium and Silicon at 77°K and 300°KPhysical Review B, 1955