Characteristics including electron velocity overshoot for 0.1- mu m-gate-length GaAs SAINT MESFET's
- 1 April 1990
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 37 (4) , 935-941
- https://doi.org/10.1109/16.52426
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- 5.9 ps/gate operation with 0.1 mu m gate-length GaAs MESFET'sPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- 0.15 μm GaAs MESFETs applied to ultrahigh-speed static frequency dividersElectronics Letters, 1989
- Characterization of a thin Si-implanted and rapid thermal annealed n-GaAs layerApplied Physics Letters, 1987
- Above 10 GHz frequency dividers with GaAs advanced saint and air-bridge technologyElectronics Letters, 1986
- Buried p-layer SAINT for very high-speed GaAs LSI's with submicrometer gate lengthIEEE Transactions on Electron Devices, 1985
- Electron transport in sub-micron GaAs channels at 300 KApplied Physics A, 1983
- Self-align implantation for n + -layer technology (SAINT) for high-speed GaAs ICsElectronics Letters, 1982
- Modeling of a submicrometer gate field-effect transistor including effects of nonstationary electron dynamicsJournal of Applied Physics, 1980
- The effects of two-dimensional charge sharing on the above-threshold characteristics of short-channel IGFETSSolid-State Electronics, 1979
- Effect of ionised impurity scattering on the electron transit time in GaAs and InP f.e.t.sElectronics Letters, 1977